Dr. Luigi Scaccabarozzi
Research Assistent at ASML Netherlands BV
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Reticles, Scanners, Particles, Resistance, Pellicles, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Protactinium

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Particles, Silicon, Manufacturing, Pellicles, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Prototyping, Protactinium

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Scanners, Ultraviolet radiation, Particles, Manufacturing, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

Proceedings Article | 10 February 2006
Proc. SPIE. 6103, Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications V
KEYWORDS: Fabry–Perot interferometers, Second-harmonic generation, Waveguides, Germanium, Gallium arsenide, Aluminum, Phase matching, Harmonic generation, Semiconducting wafers, Gallium

Proceedings Article | 31 March 2005
Proc. SPIE. 5728, Integrated Optics: Devices, Materials, and Technologies IX
KEYWORDS: Fabry–Perot interferometers, Waveguides, Cladding, Etching, Photonic crystals, Chromium, Wave propagation, Nonlinear optics, Aluminum, Optical microcavities

Showing 5 of 6 publications
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