Dr. Luke Ting Hao Hsu
Inventor at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | December 18, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Quartz, Particles, Inspection, Chromium, Digital watermarking, Oxygen, Photomasks, Extreme ultraviolet, Ruthenium, Plasma

SPIE Journal Paper | June 16, 2014
JM3 Vol. 13 Issue 02
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Critical dimension metrology, Defect detection

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Diffractive optical elements, Opacity, Particles, Inspection, Photomasks, SRAF, Cavitation, Acoustics, Binary data, Mask cleaning

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Metrology, Visualization, Opacity, Databases, Inspection, Image analysis, Scanning electron microscopy, Data acquisition, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Quartz, Particles, Silicon, Manufacturing, Inspection, Photomasks, Semiconductor manufacturing, Chemical analysis, Critical dimension metrology, Mask cleaning

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Manufacturing, Inspection, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Defect inspection

Showing 5 of 16 publications
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