Luke Kok Chin Ng
Senior Process Engineer at GLOBALFOUNDRIES Singapore
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Optical lithography, Scanners, Manufacturing, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Sensor calibration, Semiconducting wafers

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Metrology, Optical lithography, Cadmium, Photoresist materials, Process control, Finite element methods, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Optical lithography, Deep ultraviolet, Reflectivity, Surface roughness, Photoresist materials, Critical dimension metrology, Data centers, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Edge detection, Sensors, Metals, Image processing, Tungsten, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Reticles, Deep ultraviolet, Etching, Satellites, Polymers, Water, Photomasks, Photoresist processing, Semiconducting wafers, Process modeling

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