Ms. Luna S. Bozinova
at ETH Zurich
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Light sources, Metrology, High power lasers, Nd:YAG lasers, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin, Aluminium phosphide

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, High power lasers, Inspection, Control systems, Laser stabilization, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

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