Dr. Liang Chou Chen
Director of Engineering at Edmund Optics Singapore Pte Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Lithium, Manufacturing, Inspection, Electroluminescence, Photomasks, Source mask optimization, Optical proximity correction, SRAF

Proceedings Article | 8 June 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Photovoltaics, Logic, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Source mask optimization, Feedback loops

Proceedings Article | 13 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Logic devices, Source mask optimization, SRAF, Fiber optic illuminators

Proceedings Article | 10 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Atrial fibrillation, Diffractive optical elements, Electroluminescence, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optimization (mathematics)

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Point spread functions, Reticles, Data modeling, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 11 publications
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