Dr. Lynn Y. Cai Profile

Dr. Lynn Y. Cai

Senior Engineering Manager

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Publications (11)

Proceedings Article | 20 March 2018 Presentation + Paper

A novel processing platform for post tape out flows

Hien Vu, Soohong Kim, James Word, Lynn Cai

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Computing systems, Parallel processing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, SRAF, Resolution enhancement technologies, Design for manufacturability

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Proceedings Article | 13 March 2012 Paper

Full field lithographical verification using scanner and mask intrafield fingerprint

J. Planchot, L. Depre, E. Yesilada, F. Robert, F. Sundermann, H. Y. Liu, L. Cai, F. Chen

Proc. SPIE. 8326, Optical Microlithography XXV

KEYWORDS: Lithography, Metals, Scanners, Scanning electron microscopy, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

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Proceedings Article | 12 March 2008 Paper

Low-k1 logic design using gridded design rules

Michael Smayling, Hua-yu Liu, Lynn Cai

Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II

KEYWORDS: Logic, Optical lithography, Etching, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

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Proceedings Article | 20 May 2006 Paper

Simultaneous layout, process, and model optimization within an integrated design-for-yield environment

Dmitri Lapanik, Lynn Cai, Chung-Shin Kang, Bob Naber, Jason Sweis, Wolf Staud

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Calibration, Image processing, Manufacturing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Process modeling, Resolution enhancement technologies

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Proceedings Article | 5 May 2005 Paper

Lithography yield check for IC design

Lynn Cai, Ting Chen

Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III

KEYWORDS: Semiconductors, Lithography, Imaging systems, Silicon, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement, Resolution enhancement technologies

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Proceedings Article | 24 May 2004 Paper

Simulation-based mask quality control in a production environment

Linyong Pang, Jiunn-Hung Chen, Lynn Cai, Don Lee, Brian Chu, Vinsent Huang, Te-Yang Fang

Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII

KEYWORDS: Defect detection, Inspection, Control systems, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Decision support systems

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Proceedings Article | 17 December 2003 Paper

Enhanced dispositioning of reticle defects for advanced masks using virtual stepper with automated defect severity scoring

Linyong Pang, Alex Lu, Jacky Chen, Eric Guo, Lynn Cai, Jiunn-Hung Chen

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Reticles, Inspection, Printing, Photomasks, Artificial intelligence, Optical proximity correction, Virtual reality, Semiconducting wafers, Tolerancing, Decision support systems

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Proceedings Article | 27 December 2002 Paper

Automated defect severity analysis for binary and PSM mask defects

Lynn Cai, Jiunn-Hung Chen, Lin-Hsin Tu, Brian Chu, Noah Chen, Te Yang Fang, W. B. Shieh

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Defect detection, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data, Decision support systems

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Proceedings Article | 16 July 2002 Paper

Defect printability analysis study using virtual stepper system in a production environment

Shao-Yung Chiou, Henrry Lei, WeiJyh Liu, M. Chu, Daryl Chiang, Steve Tuan, Chia-Lung Hong, Michael Chang, Jiunn-Hung Chen, Kevin Chan, Qi-De Qian, Lynn Cai, Linyong Pang

Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI

KEYWORDS: Reticles, Scanners, Inspection, Scanning electron microscopy, Photomasks, Virtual reality, Semiconducting wafers, Binary data, Decision support systems, Phase shifts

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Proceedings Article | 14 September 2001 Paper

Automatic defect severity scoring for 193-nm reticle defect inspection

Linard Karklin, Mark Altamirano, Lynn Cai, Khoi Phan, Chris Spence

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Lithography, Reticles, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Virtual reality, Semiconducting wafers, Decision support systems, Resolution enhancement technologies

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Proceedings Article | 5 September 2001 Paper

Enhanced dispositioning of reticle defects using the Virtual Stepper with automated defect severity scoring

Lynn Cai, Khoi Phan, Chris Spence, Linyong Pang, Kevin Chan

Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII

KEYWORDS: Reticles, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Virtual reality, Semiconducting wafers, Tolerancing, Decision support systems

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Showing 5 of 11 publications

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