Dr. Lynn Y. Cai
Senior Engineering Manager
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Computing systems, Parallel processing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, SRAF, Resolution enhancement technologies, Design for manufacturability

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Metals, Scanners, Scanning electron microscopy, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 12 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Logic, Optical lithography, Etching, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Calibration, Image processing, Manufacturing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Process modeling, Resolution enhancement technologies

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Semiconductors, Lithography, Imaging systems, Silicon, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement, Resolution enhancement technologies

Showing 5 of 11 publications
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