My-Phung Van
PhD Candidate at ASML Netherlands BV
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Contamination, Scanners, Inspection, Reflectivity, Oxygen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | December 21, 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Photoresist materials, Polarization, Resolution enhancement technologies, Lithography, Liquid crystals, Atomic force microscopy, Polarizers, Polymers, Beam splitters, Spiral phase plates

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Holography, Polarization, Glasses, Molecules, Crystals, Photoresist materials, Liquid crystals, Polymerization, Liquids, Absorption

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