Mohamed Habib
at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Optical lithography, Reflectivity, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Model-based design

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Point spread functions, Data modeling, Calibration, 3D modeling, Fractal analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Logic, Visualization, Metals, Manufacturing, Photomasks, Shape analysis, Double patterning technology, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Cadmium, Data modeling, Calibration, Image processing, Scanning electron microscopy, Image enhancement, Optical proximity correction, Optical calibration, Statistical modeling, Process modeling

Showing 5 of 6 publications
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