Dr. Ming Mao
at imec
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Cadmium, Calibration, Etching, Silicon, 3D modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 10 October 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Etching, Metals, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 April 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Carbon, Lithography, Etching, Chemistry, Scanning electron microscopy, Photoresist materials, Line width roughness, Plasma enhanced chemical vapor deposition, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 19 publications
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