MINGYU KIM
at SKhynix
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 18 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Data modeling, Image processing, Scanners, Control systems, Zernike polynomials, Process control, High volume manufacturing, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Environmental monitoring, Contamination, Databases, Metals, Scanners, Reflectivity, Data processing, High volume manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Mathematical modeling, Data modeling, Scanners, Zernike polynomials, Process control, Feedback control, Semiconducting wafers, Statistical modeling, Performance modeling, Overlay metrology

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