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Miyeon Han
at SAMSUNG SDI Chemicals & Electronic Materials
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Publications (1)
Proceedings Article | 27 March 2017 Presentation + Paper
Investigation on spin-on hard mask integration
Yushin Park, Seungwook Shin, Yunjun Kim, Seunghyun Kim, Jaebum Lim, Sung Hwan Kim, Hyeonil Jung, Chungheon Lee, Miyeon Han, Sanghak Lim, Jeong Yun Yu
Proceedings Volume 10146, 1014616 (2017) https://doi.org/10.1117/12.2257846
KEYWORDS: System integration, Photoresist materials, Manufacturing, Bottom antireflective coatings, Silicon, Antireflective coatings, Materials processing, Photomasks, Etching, Resistance, Carbon, Reflectivity, Optical lithography, Chemical vapor deposition, Double patterning technology, Atomic layer deposition, Plasma
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