Dr. Mun Ja Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Scanners, Inspection, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Thermography, Thin films, Lithography, Graphene, Crystals, Silicon, Hydrogen, Infrared lasers, Pellicles, Silicon films, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Thin films, Lithography, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Carbon, Lithography, Computer simulations, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Ruthenium

Proceedings Article | 18 March 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Carbon, Lithography, Contamination, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Absorption

Showing 5 of 6 publications
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