Dr. Maaike Op de Beeck Profile

Dr. Maaike Op de Beeck

Program manager HUMAN++ at imec

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Author

Publications (14)

Proceedings Article | 1 April 2008 Paper

30nm half-pitch metal patterning using Moti CD shrink technique and double patterning

Janko Versluijs, J.-F. De Marneffe, Danny Goossens, Maaike Op de Beeck, Tom Vandeweyer, Vincent Wiaux, Herbert Struyf, Mireille Maenhoudt, Mohand Brouri, Johan Vertommen, Ji Soo Kim, Helen Zhu, Reza Sadjadi

Proceedings Volume 6924, 69242C (2008) https://doi.org/10.1117/12.774139

KEYWORDS: Etching, Optical proximity correction, Optical lithography, Double patterning technology, Photomasks, Scanning electron microscopy, Semiconducting wafers, Metals, Tin, Dielectrics

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Proceedings Article | 26 March 2007 Paper

Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using RELACS shrink and corresponding OPC

Maaike Op de Beeck, Janko Versluijs, Vincent Wiaux, Tom Vandeweyer, Ivan Ciofi, Herbert Struyf, Dirk Hendrickx, Jan Van Olmen

Proceedings Volume 6520, 65200I (2007) https://doi.org/10.1117/12.713393

KEYWORDS: Etching, Optical proximity correction, Photomasks, Double patterning technology, Semiconducting wafers, Photoresist processing, Atrial fibrillation, Optical lithography, Dielectrics, Scanning electron microscopy

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Proceedings Article | 21 March 2007 Paper

A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond

Maaike Op de Beeck, Janko Versluijs, Zsolt Tőkei, Steven Demuynck, J.-F. De Marneffe, Werner Boullart, Serge Vanhaelemeersch, Helen Zhu, Peter Cirigliano, Elizabeth Pavel, Reza Sadjadi, Jisoo Kim

Proceedings Volume 6519, 65190U (2007) https://doi.org/10.1117/12.713401

KEYWORDS: Etching, Lithography, 193nm lithography, Critical dimension metrology, Polymers, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Optical lithography, Scanners

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Proceedings Article | 15 March 2006 Paper

Early learning on hyper-NA lithography using two-beam immersion interference

Eric Hendrickx, Maaike Op de Beeck, Roel Gronheid, Janko Versluijs, Lieve Van Look, Monique Ercken, Geert Vandenberghe

Proceedings Volume 6154, 61541X (2006) https://doi.org/10.1117/12.659007

KEYWORDS: Polarization, Liquids, Semiconducting wafers, Electroluminescence, Printing, Water, Prisms, Refractive index, Nanoimprint lithography, Scanners

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Proceedings Article | 29 June 1998 Paper

Bottom-ARC optimization methodology for 0.25-um lithography and beyond

Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt Ronse, James Lamb, Johan van der Hilst, Johannes van Wingerden

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310762

KEYWORDS: Critical dimension metrology, Etching, Reflectivity, Semiconducting wafers, Chlorine, Ions, Lithography, Photoresist processing, Absorption, Information operations

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Proceedings Article | 7 July 1997 Paper

NA/sigma optimization strategies for an advanced DUV stepper applied to 0.25- and sub-0.25-um critical levels

Maaike Op de Beeck, Kurt Ronse, Kouros Ghandehari, Patrick Jaenen, Harry Botermans, Jo Finders, John Lilygren, Daniel Baker, Geert Vandenberghe, Peter De Bisschop, Mireille Maenhoudt, Luc Van den Hove

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275973

KEYWORDS: Deep ultraviolet, Logic, Photoresist processing, Dry etching, Etching

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Proceedings Article | 7 June 1996 Paper

Optical proximity effects and correction strategies for chemical-amplified DUV resists

Maaike Op de Beeck, Bert Bruggeman, Harry Botermans, Veerle Van Driessche, Anthony Yen, Alexander Tritchkov, Rik Jonckheere, Kurt Ronse, Luc Van den Hove

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240927

KEYWORDS: Etching, Optical proximity correction, Photomasks, Critical dimension metrology, Chlorine, Scanning electron microscopy, Deep ultraviolet, Silicon, Lithium, Photoresist processing

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Proceedings Article | 7 June 1996 Paper

DUV resist profile improvement on TiN-deposited metal layer

Chia-Hui Lin, Chun-Cho Chen, Jhy-Sayang Jenq, Maaike Op de Beeck, Luc Van den Hove

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240968

KEYWORDS: Deep ultraviolet, Tin, Photoresist processing, Lithography, Metals, Thin films, Hydrogen, Scanning electron microscopy, Critical dimension metrology, Oxygen

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Proceedings Article | 7 June 1996 Paper

Characterization and optimization of CD control for 0.25-um CMOS applications

Kurt Ronse, Maaike Op de Beeck, Anthony Yen, Keeho Kim, Luc Van den Hove

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240924

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Lithography, Software development, Optical lithography, Scanning electron microscopy, Photoresist processing, Deep ultraviolet, Control systems

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Proceedings Article | 16 May 1994 Paper

Lithographic strategies for 0.35 um poly gates for random logic applications

Maaike Op de Beeck, Veerle Van Driessche, Luc Van den Hove, Han Dijkstra

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175356

KEYWORDS: Etching, Photoresist processing, Deep ultraviolet, Reflectivity, Reflection, Semiconducting wafers, Lithography, Optical lithography, Silicon, Thin films

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Proceedings Article | 1 June 1992 Paper

Novel process for phase-shifting mask fabrication

Haruhiko Kusunose, Satoshi Aoyama, Kunihiro Hosono, Susumu Takeuchi, Shuichi Matsuda, Maaike Op de Beeck, Nobuyuki Yoshioka, Yaichiro Watakabe

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130323

KEYWORDS: Phase shifts, Chromium, Photomasks, Etching, Mask making, Ultraviolet radiation, Metals, Quartz, Inspection, Floods

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Proceedings Article | 1 July 1991 Paper

Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications

Maaike Op de Beeck, Akira Tokui, Masato Fujinaga, Nobuyuki Yoshioka, Kazuya Kamon, Tetsuro Hanawa, Katsuhiro Tsukamoto

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44781

KEYWORDS: Phase shifts, Photomasks, Metals, Lithium, Optical lithography, Quartz, Mask making, Computer aided design, Deep ultraviolet, Electron beam lithography

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Proceedings Article | 1 June 1990 Paper

Reduction of lateral swelling and incoporation of DESIRE in MOS processing

Anne-Marie Goethals, David Nichols, Maaike Op de Beeck, P. De Geyter, Ki-Ho Baik, Luc Van den Hove, Bruno Roland, Ria Lombaerts

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20116

KEYWORDS: Silicon, Polymers, Etching, Head-mounted displays, Picture Archiving and Communication System, Photoresist processing, Deep ultraviolet, Molybdenum, Distortion, Semiconducting wafers

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Proceedings Article | 1 June 1990 Paper

Sub-half-micron deep-UV lithography using wet and dry developable resist schemes

Maaike Op de Beeck, Nandasiri Samarakone, Ki-Ho Baik, Luc Van den Hove, Douglas Ritchie

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20130

KEYWORDS: Deep ultraviolet, Signal to noise ratio, Silicon, Etching, Aluminum, Reflectivity, Lithography, Resistance, Head-mounted displays, Dry etching

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Showing 5 of 14 publications

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