Dr. Maaike Op de Beeck
Program manager HUMAN++ at IMEC
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Etching, Metals, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Tin

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Atrial fibrillation, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 21 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Scanners, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Prisms, Polarization, Water, Scanners, Electroluminescence, Printing, Nanoimprint lithography, Semiconducting wafers, Liquids

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Lithography, Etching, Ions, Reflectivity, Critical dimension metrology, Chlorine, Photoresist processing, Semiconducting wafers, Information operations, Absorption

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Logic, Deep ultraviolet, Etching, Dry etching, Photoresist processing

Showing 5 of 14 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top