Dr. Maarten J. Jansen
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Particles, Silicon, Manufacturing, Pellicles, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Prototyping, Protactinium

PROCEEDINGS ARTICLE | February 26, 2004
Proc. SPIE. 5252, Optical Fabrication, Testing, and Metrology
KEYWORDS: Mirrors, Metrology, Interferometers, Calibration, Distortion, Distance measurement, Optical alignment, Phase measurement, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | November 20, 2003
Proc. SPIE. 5190, Recent Developments in Traceable Dimensional Measurements II
KEYWORDS: Mirrors, Beam splitters, Optical amplifiers, Polarization, Interferometers, Calibration, Receivers, Heterodyning, Phase measurement, Signal detection

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