Dr. Madhura Nataraju
Graduate Research Assistant at Univ of Wisconsin Madison
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

PROCEEDINGS ARTICLE | October 24, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Distortion, Electron beam lithography, 3D modeling, Etching, Interferometry, Surface finishing, Thin films

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Distortion, Reticles, 3D modeling, Etching, Electron beam lithography, Surface finishing, Thin films, Multilayers

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Reticles, Extreme ultraviolet lithography, Standards development, Photomasks, Interferometers, Photography, Dielectrics, Finite element methods, Coating, Interferometry

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Data modeling, Photomasks, Extreme ultraviolet lithography, Interferometers, Standards development, Finite element methods, Photography, Vibration isolation, Particles

Showing 5 of 11 publications
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