Dr. Madhura Nataraju
Graduate Research Assistant at Univ of Wisconsin Madison
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Mathematical modeling, Reticles, Data modeling, Photography, Interferometry, Control systems, 3D modeling, Image quality, Photomasks, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Reticles, Lithographic illumination, Mechanics, Interferometry, Kinematics, 3D modeling, Photomasks, Extreme ultraviolet lithography, Standards development

PROCEEDINGS ARTICLE | October 24, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Thin films, Electron beam lithography, Reticles, Etching, Interferometry, Distortion, 3D modeling, Photomasks, Extreme ultraviolet lithography, Surface finishing

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Thin films, Electron beam lithography, Multilayers, Reticles, Etching, Distortion, 3D modeling, Photomasks, Extreme ultraviolet lithography, Surface finishing

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Reticles, Interferometers, Dielectrics, Photography, Coating, Interferometry, Finite element methods, Photomasks, Extreme ultraviolet lithography, Standards development

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Data modeling, Interferometers, Particles, Photography, Finite element methods, Photomasks, Extreme ultraviolet lithography, Vibration isolation, Standards development

Showing 5 of 11 publications
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