Dr. Madhura Nataraju
Graduate Research Assistant at Univ of Wisconsin-Madison
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Mathematical modeling, Reticles, Data modeling, Photography, Interferometry, Control systems, 3D modeling, Image quality, Photomasks, Extreme ultraviolet lithography

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Reticles, Lithographic illumination, Mechanics, Interferometry, Kinematics, 3D modeling, Photomasks, Extreme ultraviolet lithography, Standards development

Proceedings Article | 24 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Thin films, Electron beam lithography, Reticles, Etching, Interferometry, Distortion, 3D modeling, Photomasks, Extreme ultraviolet lithography, Surface finishing

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Thin films, Electron beam lithography, Multilayers, Reticles, Etching, Distortion, 3D modeling, Photomasks, Extreme ultraviolet lithography, Surface finishing

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Reticles, Interferometers, Dielectrics, Photography, Coating, Interferometry, Finite element methods, Photomasks, Extreme ultraviolet lithography, Standards development

Showing 5 of 11 publications
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