Mr. Mahatma Lin
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Inspection, Wafer inspection, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

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