Mai Randall
at IBM Microelectronics Div
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Contamination, Particles, Chemistry, Optical inspection, Frequency modulation, Fermium, Semiconducting wafers, Camera shutters, Process engineering, 193nm lithography

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Contamination, Chemistry, Manufacturing, Inspection, Frequency modulation, Fermium, Photoresist processing, Semiconducting wafers, Tolerancing

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Coating, Control systems, Photoresist materials, Process control, Thin film coatings, Photoresist processing, Semiconducting wafers, Wafer testing, Automatic tracking

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