Maki Tanaka
Chief Engineer at Hitachi High-Tech Corp
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: 3D acquisition, Scattering, Calibration, Nondestructive evaluation, Scanning electron microscopy, Monte Carlo methods, 3D metrology

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Scanning electron microscopy, Model-based design, Monte Carlo methods, Calibration, Cadmium, Mathematical modeling, 3D metrology, Scatterometry, Semiconducting wafers, Metrology

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Wafer-level optics, Lithography, Metrology, Calibration, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Process control, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Mathematical modeling, Calibration, Silicon, Scanning electron microscopy, Scatterometry, Monte Carlo methods, 3D metrology, Semiconducting wafers, Model-based design, 3D image processing

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Cadmium, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Finite element methods, Terbium, Double patterning technology, Critical dimension metrology, Semiconducting wafers

Showing 5 of 26 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top