Makiko Irie
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Light sources, Optical lithography, Polymers, Diffusion, Manufacturing, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Semiconducting wafers, Plasma treatment, Plasma

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