Makoto Kozuma
at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Critical dimension metrology, Scanners, Wafer-level optics, Manufacturing, Lutetium, Microelectronics

Proceedings Article | 11 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Air contamination, Photomasks, Reticles, Pellicles, Atmospheric particles, Sulfur, Gases, Nitrogen, Semiconducting wafers, Semiconductors

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Ozone, Scanning probe microscopy, Photomasks, Ions, Hydrogen, Reflectivity, Manufacturing, Particles, Plasma, Photoresist processing

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Chromium, Printing, 193nm lithography, Quartz, Polishing, Lutetium, Microelectronics

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Photoresist processing, Etching, Manufacturing, Edge roughness, Chemically amplified resists, Tin, Electronics

Showing 5 of 8 publications
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