Dr. Makoto Sugihara
at Toyohashi Univ of Technology
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mathematical modeling, Lithography, Electron beams, Photomasks, Transistors, Bismuth, Beam shaping, Semiconducting wafers, Binary data, Vestigial sideband modulation

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Electron beams, Logic, Silicon, Software development, Laser induced breakdown spectroscopy, Photomasks, Maskless lithography, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Logic, Manufacturing, Computer programming, Projection systems, Photomasks, Source mask optimization, Binary data, Systems modeling, Vestigial sideband modulation

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Electron beams, Logic, Silicon, Manufacturing, Photomasks, Beam shaping, Maskless lithography, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Electron beams, Logic, Manufacturing, Software development, Laser induced breakdown spectroscopy, Photomasks, Maskless lithography, Semiconducting wafers, Vestigial sideband modulation

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