Makoto Yoshikawa
at Advantest Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Metrology, Sensors, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Time metrology, 3D metrology, Photomasks, Algorithm development, 3D image processing

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Metrology, Sensors, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Line edge roughness, Semiconducting wafers, 3D image processing

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