Dr. Malahat A. Tavassoli
Area Engineering Manager at Intel Corp
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Cadmium, Spectroscopy, Scanning electron microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Critical dimension metrology, Line edge roughness

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Cadmium, Control systems, Scanning electron microscopy, Time metrology, Photomasks, Computed tomography, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Cadmium, Etching, Scanners, Photomasks, Phase measurement, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 31 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Metrology, Polarization, Scanners, Image resolution, Printing, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

Proceedings Article | 12 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Diffraction, Phase shifting, Metrology, Polarization, Etching, Scanners, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

Showing 5 of 16 publications
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