Malavika Sharma
at Mentor Graphics (India) Private Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 October 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Waveguides, Data processing, Neural networks, Photomasks, Machine learning, Computational lithography, Optical proximity correction, Vestigial sideband modulation

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Scattering, Calibration, Etching, Control systems, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Photoresist processing, Model-based design, Process modeling

Proceedings Article | 31 October 2017 Presentation + Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Model-based design

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top