Prof. Malcolm C. Gower
Professor/Retired at Imperial College London
SPIE Involvement:
Senior status | Conference Program Committee | Conference Chair | Author | Editor
Area of Expertise:
Laser micro and nanomachining , DUV and EUV lithography , Nonlinear optics , Laser systems , Optical design , Industrial laser applications
Profile Summary

BSc in Physics and Pure Math from University of Hull, MSc in Physics from Univ of Western Ontario and PhD in Physics from York University, Toronto. Has held teaching and research positions at NASA-Ames Research Center, the University of California, Berkeley, Oxford University and the Rutherford Appleton Laboratory working on the scientific and industrial applications of photons, lasers and optics. In 1984 co-founded Exitech a world-leading manufacturer of photon-based micro and nano-fabrication tools. Pioneered techniques and industrial applications of laser micromachining and DUV/EUV lithography. Currently visiting Professor of Laser Micro and Nanofabrication at Imperial College, London and CEO of Nanophoton Technologies a company specializing in applying photonics to nanotechnology.

A Fellow of the IET, the IoP and past-President of the Association of Industrial Laser Users (AILU). Advisor on various European Union, UK and Canadian Government committees on R&D policies in areas of laser applications, photonics, MEMS, nanotechnology and microelectronics. In 1993 was awarded an MBE (member of the Order of the British Empire) by Queen Elizabeth II in recognition of services to industrial laser development.
Publications (36)

PROCEEDINGS ARTICLE | February 20, 2008
Proc. SPIE. 6879, Photon Processing in Microelectronics and Photonics VII
KEYWORDS: Lithography, Solar cells, Silicon, Laser processing, Manufacturing, Laser applications, Laser drilling, Photomasks, Excimer lasers, Micromachining

PROCEEDINGS ARTICLE | March 22, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Microscopes, Reticles, Imaging systems, Particles, Inspection, Image analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Vibration isolation

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Microscopes, Mirrors, Reticles, Imaging systems, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Microscopes, Mirrors, Reticles, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | September 20, 2004
Proc. SPIE. 5448, High-Power Laser Ablation V
KEYWORDS: Wafer-level optics, Reticles, Deep ultraviolet, Sensors, Manufacturing, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Objectives, Photomasks, Nanoimprint lithography, Line edge roughness, Tolerancing, Binary data, Resolution enhancement technologies

Showing 5 of 36 publications
Conference Committee Involvement (9)
Laser Applications in Microelectronic and Optoelectronic Manufacturing XIV
26 January 2009 | San Jose, California, United States
High-Power Laser Ablation V
25 April 2004 | Taos, New Mexico, United States
Optical Microlithography XVII
24 February 2004 | Santa Clara, California, United States
Laser Applications in Microelectronic and Optoelectronic Manufacturing IX
26 January 2004 | San Jose, Ca, United States
Laser Beam Shaping IV
6 August 2003 | San Diego, California, United States
Showing 5 of 9 published special sections
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