Mame-Kouna Top
at STMicroelectronics
SPIE Involvement:
Publications (4)

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76381Y (2010)
KEYWORDS: Scanning electron microscopy, Optical proximity correction, Metrology, Calibration, Data modeling, Inspection, Process control, Optical lithography, Current controlled current source, Atomic force microscopy

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72721G (2009)
KEYWORDS: Mahalanobis distance, Critical dimension metrology, Optical proximity correction, Calibration, Fuzzy logic, Data modeling, Reliability, Scanning electron microscopy, Lithography, Optics manufacturing

Proceedings Article | 16 March 2009 Paper
Franck Foussadier, Emek Yesilada, Jean-Christophe Le Denmat, Yorick Trouiller, Vincent Farys, Frédéric Robert, Gurwan Kerrien, Christian Gardin, Loic Perraud, Florent Vautrin, Alexandre Villaret, Catherine Martinelli, Jonathan Planchot, Jean Luc Di-Maria, Mazen Saied, Mame Kouna Top
Proceedings Volume 7274, 727416 (2009)
KEYWORDS: Optical proximity correction, Critical dimension metrology, Computer simulations, Optical simulations, Optical lithography, Current controlled current source, Optical imaging, Databases, Process modeling, Photomasks

Proceedings Article | 12 March 2008 Paper
V. Farys, F. Robert, C. Martinelli, Y. Trouiller, F. Sundermann, C. Gardin, J. Planchot, G. Kerrien, F. Vautrin, M. Saied, E. Yesilada, F. Foussadier, A. Villaret, L. Perraud, B. Vandewalle, J. C. Le Denmat, M. K. Top
Proceedings Volume 6924, 69242Z (2008)
KEYWORDS: SRAF, Optical proximity correction, Lithography, Eye, Photomasks, Immersion lithography, Manufacturing, Logic, Switching, Printing

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