Mame-Kouna Top
at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Optical lithography, Data modeling, Calibration, Inspection, Atomic force microscopy, Scanning electron microscopy, Process control, Optical proximity correction, Current controlled current source

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Data modeling, Calibration, Reliability, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Fuzzy logic, Mahalanobis distance

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical imaging, Optical lithography, Databases, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, Critical dimension metrology, Process modeling, Current controlled current source

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Eye, Logic, Switching, Manufacturing, Printing, Photomasks, Immersion lithography, Optical proximity correction, SRAF

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