Mamoru Terai
Head Researcher at Mitsubishi Electric Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Scanners, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Particles, Silicon, Calcium, Coating, Manufacturing, Immersion lithography, Head-mounted displays, Fluorine, Semiconducting wafers, Prototyping

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: FT-IR spectroscopy, Optical lithography, Silica, Etching, Silicon, Coating, Scanning electron microscopy, Photomasks, Double patterning technology, Photoresist processing

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Water, Digital watermarking, Surface properties, Bridges, Chemical analysis, Immersion lithography, Semiconducting wafers, Standards development, Defect inspection

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Contamination, Scanners, Chemical analysis, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Absorption, Defect inspection

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Contamination, Statistical analysis, Ions, Adsorption, Chemical analysis, Immersion lithography, Neodymium, Technetium, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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