Mana Tanabe
at Toshiba Memory Corp.
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 September 2019 Presentation + Paper
Proceedings Volume 11148, 111480N (2019) https://doi.org/10.1117/12.2536471
KEYWORDS: Particles, Photomasks, Nanoparticles, Liquids, Nanotechnology, Inspection, Lithography, Optical lithography

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 99852E (2016) https://doi.org/10.1117/12.2243575
KEYWORDS: Lithography, Nanoimprint lithography, Image quality, Etching, Photoresist processing, Optical lithography, Defect inspection, X-rays, Double patterning technology, Semiconducting wafers

Proceedings Article | 10 May 2016 Paper
Proceedings Volume 9984, 99840T (2016) https://doi.org/10.1117/12.2242363
KEYWORDS: Nanoimprint lithography, Optical lithography, Lithography, Dry etching, Image processing, Photoresist processing, Etching, Scanning electron microscopy, Semiconducting wafers, Vestigial sideband modulation

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top