Dr. Manabu Hakko
at Canon Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Optical resolution, Photomasks, Nanoimprint lithography, Flat panel displays, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Curium, Calcium, Computer simulations, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Cadmium, Scattering, Fourier transforms, Image transmission, Photomasks, Image enhancement, Source mask optimization, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Light sources, Reticles, Polarization, Fourier transforms, Image resolution, Printing, Image enhancement, SRAF, Binary data, Resolution enhancement technologies

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