Mr. Manabu Takakuwa
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Lithography, Metrology, Statistical analysis, Visualization, Error analysis, Inspection, Optimization (mathematics), Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Radon, Control systems, Distortion, Process control, Immersion lithography, Source mask optimization, Semiconducting wafers, Data corrections, Overlay metrology, Osmium

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lithographic illumination, Metals, Scanners, Photomasks, Logic devices, SRAF, Binary data

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Metals, Immersion lithography, Logic devices, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Data modeling, Databases, Scanners, Error analysis, Control systems, Distortion, Semiconducting wafers, Systems modeling, Overlay metrology

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