Dr. Manfred Moert
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Electron beams, Metrology, Cadmium, Scatterometry, Line width roughness, Critical dimension metrology, Line edge roughness, Electron beam direct write lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 3, 2008
Proc. SPIE. 7155, Ninth International Symposium on Laser Metrology
KEYWORDS: Metrology, Atomic force microscopy, Scatterometry, Dimensional metrology, Infrared radiation, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Thermal modeling, Model-based design

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, 3D applications, Scattering, 3D modeling, Scanning electron microscopy, Scatterometry, 3D metrology, Process control, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Etching, Silicon, 3D modeling, Atomic force microscopy, Scatterometry, 3D metrology, Process control, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Scanning electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Finite element methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

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