Dr. Manish Chandhok
Senior CAD Engineer at Intel Corp
SPIE Involvement:
Author
Publications (38)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymethylmethacrylate, Etching, Dry etching, Annealing, Scanning electron microscopy, Photoresist materials, Directed self assembly, Wet etching, Picosecond phenomena, Photoresist developing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Refractive index, Phase shifting, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Annealing, Laser development, Surface roughness, Carbon dioxide lasers, Atomic force microscopy, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Annealing, Diffusion, Carbon dioxide lasers, Extreme ultraviolet lithography, Semiconducting wafers, Temperature metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Phase shifting, Reflection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Cadmium sulfide, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Materials processing, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Photoresist developing

Showing 5 of 38 publications
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