Dr. Manish Chandhok Profile

Dr. Manish Chandhok

Senior CAD Engineer at Intel Corp

SPIE Involvement:

Author

Publications (38)

Proceedings Article | 20 March 2015 Paper

Paper

Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch

Eungnak Han, Todd Younkin, Manish Chandhok, Alan Myers, Tristan Tronic, Florian Gstrein, Kranthi Elineni, Ashish Gaikwad, Paul Nyhus, Praveen Setu, Charles Wallace

Proceedings Volume 9425, 94250O (2015) https://doi.org/10.1117/12.2086094

KEYWORDS: Etching, Photoresist developing, Wet etching, Scanning electron microscopy, Polymethylmethacrylate, Annealing, Dry etching, Photoresist materials, Picosecond phenomena, Directed self assembly

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Proceedings Article | 14 October 2011 Paper

Paper

Phase-shifting effect of thin-absorber EUV masks

Hiroyoshi Tanabe, Tetsunori Murachi, Sang H. Lee, Manish Chandhok, Seh-Jin Park, Guojing Zhang, Tsukasa Abe, Taichi Ogase, Naoya Hayashi

Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

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Proceedings Article | 16 April 2011 Paper

Paper

LWR reduction and flow of chemically amplified resist patterns during sub-millisecond heating

Byungki Jung, Christopher Ober, Michael Thompson, Manish Chandhok

Proceedings Volume 7972, 79722S (2011) https://doi.org/10.1117/12.881675

KEYWORDS: Line width roughness, Critical dimension metrology, Scanning electron microscopy, Annealing, Surface roughness, Carbon dioxide lasers, Chemically amplified resists, Laser development, Atomic force microscopy, Optical lithography

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Proceedings Article | 16 April 2011 Paper

Paper

Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists

Byungki Jung, Christopher Ober, Michael Thompson, Todd Younkin, Manish Chandhok

Proceedings Volume 7972, 797219 (2011) https://doi.org/10.1117/12.879288

KEYWORDS: Diffusion, Carbon dioxide lasers, Extreme ultraviolet lithography, Temperature metrology, Annealing, Deep ultraviolet, Lithography, Chemically amplified resists, Polymers, Semiconducting wafers

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Proceedings Article | 8 April 2011 Paper

Paper

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Sang Lee, Todd Younkin, Michael Leeson, Manish Chandhok, Guojing Zhang, John Magana, Hiroyoshi Tanabe, Steve Carson

Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

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Proceedings Article | 8 April 2011 Paper

Paper

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd Younkin, Michael Leeson, Roman Caudillo, Terence Bacuita, Uday Shah, Manish Chandhok

Proceedings Volume 7969, 79692K (2011) https://doi.org/10.1117/12.879641

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Photoresist materials, Photoresist developing, Materials processing, Lithography, Etching, Scanning electron microscopy

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Proceedings Article | 5 April 2011 Paper

Paper

EUVL alternating phase shift mask

Pei-Yang Yan, Alan Myers, Yashesh Shroff, Manish Chandhok, Guojing Zhang, Eric Gullikson, Farhad Salmassi

Proceedings Volume 7969, 79690G (2011) https://doi.org/10.1117/12.884790

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Binary data, Etching, Semiconducting wafers, Line width roughness, Phase shifts, Optical lithography, Printing, Image resolution

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Proceedings Article | 26 March 2010 Paper

Paper

Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment

Byungki Jung, Jing Sha, Florencia Paredes, Christopher Ober, Michael Thompson, Manish Chandhok, Todd Younkin

Proceedings Volume 7639, 76390L (2010) https://doi.org/10.1117/12.848418

KEYWORDS: Diffusion, Deep ultraviolet, Carbon dioxide lasers, Polymers, Annealing, Imaging systems, Extreme ultraviolet lithography, Chemically amplified resists, Temperature metrology, Absorption

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Proceedings Article | 20 March 2010 Paper

Paper

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd Younkin, Roman Caudillo, Manish Chandhok

Proceedings Volume 7636, 76360P (2010) https://doi.org/10.1117/12.842408

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Lithography, Photoresist processing, Optical lithography, Photoresist materials, Lithographic illumination, Lead

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Proceedings Article | 1 April 2009 Paper

Paper

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

E. Steve Putna, Todd Younkin, Manish Chandhok, Kent Frasure

Proceedings Volume 7273, 72731L (2009) https://doi.org/10.1117/12.814191

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Polymers, Photoresist processing, Standards development, Optical lithography, Glasses, Lithography, Photoresist materials

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Proceedings Article | 1 April 2009 Paper

Paper

Characterization of the photoacid diffusion length

Shuhui Kang, Vivek Prabhu, Wen-li Wu, Eric Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh

Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555

KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 18 March 2009 Paper

Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Paper

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan Myers, Michael Leeson, Marilyn Kamna, Fabian Martinez, Alan Stivers, Gian Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen

Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428

KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

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Proceedings Article | 17 October 2008 Paper

Paper

Pattern placement correction due to bending in EUVL masks

Seh-Jin Park, Chandhok Manish, Marilyn Kamna, Chuan Hu, Guojing Zhang, Fabian Martinez, Nathan Wilcox, Kamgmin Hsia, Alan Stivers

Proceedings Volume 7122, 71222C (2008) https://doi.org/10.1117/12.801542

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

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Proceedings Article | 21 March 2008 Paper

Paper

Radiation-induced defect formation and reactivity of model TiO2 capping layers with MMA: a comparison with Ru

B. Yakshinskiy, M. Hedhili, S. Zalkind, M. Chandhok, Theodore Madey

Proceedings Volume 6921, 692114 (2008) https://doi.org/10.1117/12.772798

KEYWORDS: Oxygen, Ruthenium, Carbon, Telescopic pixel displays, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Photons, Contamination, Titanium dioxide

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Proceedings Article | 20 March 2008 Paper

Paper

Mo/Si multilayers with enhanced TiO2- and RuO2-capping layers

Sergiy Yulin, Nicolas Benoit, Torsten Feigl, Norbert Kaiser, Ming Fang, Manish Chandhok

Proceedings Volume 6921, 692118 (2008) https://doi.org/10.1117/12.772653

KEYWORDS: Reflectivity, Multilayers, Mirrors, Extreme ultraviolet lithography, Silicon, Carbon, Molybdenum, Extreme ultraviolet, Oxidation, Titanium dioxide

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Proceedings Article | 12 April 2007 Paper

Paper

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric Lin, Wen-li Wu, John Woodward, Michael Leeson, Heidi Cao, Manish Chandhok, George Thompson

Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407

KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

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Proceedings Article | 22 March 2007 Paper

Paper

Impact of line-width roughness on Intel’s 65-nm process devices

Manish Chandhok, Suman Datta, Daniel Lionberger, Scott Vesecky

Proceedings Volume 6519, 65191A (2007) https://doi.org/10.1117/12.712955

KEYWORDS: Line width roughness, Critical dimension metrology, Transistors, Photomasks, Cadmium, Ions, Etching, Optical lithography, Metals, Molybdenum

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Proceedings Article | 19 March 2007 Paper

Paper

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

S. Hill, I. Ermanoski, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Fang, M. Chandhok

Proceedings Volume 6517, 65170G (2007) https://doi.org/10.1117/12.712286

KEYWORDS: Reflectivity, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Silicon, Ruthenium, Electrons, Ions, Oxidation

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Proceedings Article | 13 March 2007 Paper

Paper

EUV lithography program at IMEC

Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Manish Chandhok, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, Roel Gronheid, Bart Baudemprez, Kurt Ronse

Proceedings Volume 6517, 651709 (2007) https://doi.org/10.1117/12.710798

KEYWORDS: Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Photomasks, Line edge roughness, Point spread functions, Scanners, Lithography, Printing, Critical dimension metrology

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask process development and integration

Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric Lanzendorf, Chang Ju Choi, Emily Shu, Alan Stivers, Jeff Farnsworth, Kangmin Hsia, Manish Chandhok, Michael Leeson, Gilroy Vandentop

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Paper

Process window study with various partial coherences on EUV MET (Micro Exposure Tool) optics

Sang Lee, Courtney Brewer, Manish Chandhok

Proceedings Volume 6151, 61512V (2006) https://doi.org/10.1117/12.657695

KEYWORDS: Extreme ultraviolet lithography, Lithography, Lithographic illumination, Extreme ultraviolet, Semiconducting wafers, EUV optics, Optical lithography, Light sources, Cadmium sulfide, Logic

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Proceedings Article | 23 March 2006 Paper

Paper

EUV testing of multilayer mirrors: critical issues

S. Hill, I. Ermanoski, S. Grantham, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Chandhok, P. Yan, O. Wood, S. Wurm, N. Edwards

Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

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Proceedings Article | 6 May 2005 Paper

Paper

Characterization of flare on Intel’s EUV MET

Sang Hun Lee, Manish Chandhok, Jeanette Roberts, Bryan Rice

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600154

KEYWORDS: Extreme ultraviolet, Point spread functions, Mirrors, Extreme ultraviolet lithography, Photomasks, Scattering, Wavefronts, Lithography, Deep ultraviolet, Light scattering

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Proceedings Article | 6 May 2005 Paper

Paper

Flare and lens aberration requirements for EUV lithographic tools

Sang Hun Lee, Yashesh Shroff, Manish Chandhok

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.604870

KEYWORDS: Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Control systems, Photomasks, Data modeling, Cadmium, Projection systems

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Proceedings Article | 6 May 2005 Paper

Paper

One small step: world's first integrated EUVL process line

Jeanette Roberts, Terence Bacuita, Robert Bristol, Heidi Cao, Manish Chandhok, Sang Lee, Eric Panning, Melissa Shell, Guojing Zhang, Bryan Rice

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600259

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Reflectivity, Reticles, Mirrors, Light sources, Plasma, Mask making

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Proceedings Article | 4 May 2005 Paper

Paper

EUV resist patterning performance from the Intel microexposure tool (MET)

Heidi Cao, Wang Yueh, Jeanette Roberts, Bryan Rice, Robert Bristol, Manish Chandhok

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600214

KEYWORDS: Line width roughness, Extreme ultraviolet, Optical lithography, Absorbance, Scatterometry, Scanning electron microscopy, Lithography, Scatter measurement, Image resolution, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2004 Paper

Paper

Anisotropic EUV flare measured in the engineering test stand (ETS)

Sang Hun Lee, Manish Chandhok, Christof Krautschik, Michael Goldstein

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537311

KEYWORDS: Extreme ultraviolet, Mirrors, Projection systems, Extreme ultraviolet lithography, Polishing, Lithography, Scattering, Critical dimension metrology, Deep ultraviolet, Photomasks

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Proceedings Article | 20 May 2004 Paper

Paper

Techniques for directly measuring the absorbance of photoresists at EUV wavelengths

Manish Chandhok, Heidi Cao, Wang Yueh, Eric Gullikson, Robert Brainard, Stewart Robertson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535959

KEYWORDS: Absorbance, Reflectivity, Photoresist materials, Semiconducting wafers, Silicon, Extreme ultraviolet, Grazing incidence, Refraction, Extreme ultraviolet lithography, X-rays

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Proceedings Article | 20 May 2004 Paper

Paper

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Manish Chandhok, Sang Lee, Christof Krautschik, Guojing Zhang, Bryan Rice, Michael Goldstein, Eric Panning, Robert Bristol, Alan Stivers, Melissa Shell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535995

KEYWORDS: Point spread functions, Modulation transfer functions, Mirrors, Extreme ultraviolet lithography, Critical dimension metrology, Spatial frequencies, Extreme ultraviolet, Optical proximity correction, Fourier transforms, Deep ultraviolet

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Proceedings Article | 20 May 2004 Paper

Paper

Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

Manish Chandhok, Sang Lee, Christof Krautschik, Bryan Rice, Eric Panning, Michael Goldstein, Melissa Shell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536024

KEYWORDS: Critical dimension metrology, Mirrors, Point spread functions, Nanoimprint lithography, Cadmium, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Polishing, Spatial frequencies

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Proceedings Article | 20 May 2004 Paper

Paper

EUV resist imaging below 50 nm using coherent spatial filtering techniques

Michael Shumway, Eric Snow, Kenneth Goldberg, Patrick Naulleau, Heidi Cao, Manish Chandhok, James Liddle, Erik Anderson, Jeffrey Bokor

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535666

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Gold, Photomasks, Spatial filters, Line edge roughness, Printing, Wafer-level optics, Extreme ultraviolet lithography, Spatial frequencies

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Proceedings Article | 14 May 2004 Paper

Paper

Sources of line-width roughness for EUV resists

Heidi Cao, Wang Yueh, Bryan Rice, Jeanette Roberts, Terence Bacuita, Manish Chandhok

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536041

KEYWORDS: Line width roughness, Photoresist materials, Polymers, Diffusion, Molecules, Extreme ultraviolet, Line edge roughness, Scanning electron microscopy, Lithography, Edge roughness

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Proceedings Article | 14 May 2004 Paper

Paper

Patterning capabilities of EUV resists

Wang Yueh, Heidi Cao, Manish Chandhok, Sang Lee, Michael Shumway, Jeff Bokor

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536021

KEYWORDS: Line width roughness, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Optical lithography, Lithography, Line edge roughness, Polymers, Manufacturing

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Proceedings Article | 16 June 2003 Paper

Paper

Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna O'Connell, Michael Goldstein

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485547

KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, Point spread functions, Lithography, Wavefronts, Spatial frequencies, Extreme ultraviolet lithography, Polishing, Surface roughness

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Proceedings Article | 16 June 2003 Paper

Paper

Implementing flare compensation for EUV masks through localized mask CD resizing

Christof Krautschik, Manish Chandhok, Guojing Zhang, Sang Hun Lee, Michael Goldstein, Eric Panning, Bryan Rice, Robert Bristol, Vivek Singh

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482344

KEYWORDS: Photomasks, Critical dimension metrology, Point spread functions, Chromium, Cadmium, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Mirrors

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Proceedings Article | 12 June 2003 Paper

Paper

Effects of processing parameters on line-width roughtness

Bryan Rice, Heidi Cao, Manish Chandhok, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485162

KEYWORDS: Line width roughness, Line edge roughness, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Silicon, Lithography, Ultrasonics, Ultrasonography, Edge roughness

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Proceedings Article | 12 June 2003 Paper

Paper

Intel's EUV resist development

Heidi Cao, Jeanette Roberts, Janel Dalin, Manish Chandhok, Robert Meagley, Eric Panning, Melissa Shell, Bryan Rice

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485095

KEYWORDS: Extreme ultraviolet, Line width roughness, Absorbance, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Lithography, Polymers, Line edge roughness

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Showing 5 of 38 publications

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