Dr. Manish Chandhok
Senior CAD Engineer at Intel Corp
SPIE Involvement:
Publications (38)

Proceedings Article | 20 March 2015 Paper
Eungnak Han, Todd Younkin, Manish Chandhok, Alan Myers, Tristan Tronic, Florian Gstrein, Kranthi Elineni, Ashish Gaikwad, Paul Nyhus, Praveen Setu, Charles Wallace
Proceedings Volume 9425, 94250O (2015) https://doi.org/10.1117/12.2086094
KEYWORDS: Etching, Photoresist developing, Wet etching, Scanning electron microscopy, Polymethylmethacrylate, Annealing, Dry etching, Photoresist materials, Picosecond phenomena, Directed self assembly

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79722S (2011) https://doi.org/10.1117/12.881675
KEYWORDS: Line width roughness, Critical dimension metrology, Scanning electron microscopy, Annealing, Surface roughness, Carbon dioxide lasers, Chemically amplified resists, Laser development, Atomic force microscopy, Optical lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797219 (2011) https://doi.org/10.1117/12.879288
KEYWORDS: Diffusion, Carbon dioxide lasers, Extreme ultraviolet lithography, Temperature metrology, Annealing, Deep ultraviolet, Lithography, Chemically amplified resists, Polymers, Semiconducting wafers

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

Showing 5 of 38 publications
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