Manish Jaideo Patil
at Photronics Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Air contamination, Molecules, Ions, Chromium, Pellicles, Adsorption, Surface properties, Photomasks, Semiconducting wafers, Thermodynamics

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Capillaries, Manufacturing, Photoresist materials, Photomasks, SRAF, Photoresist processing

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Deep ultraviolet, Quartz, Air contamination, Ions, Chromium, Pellicles, Surface properties, Transmittance, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Contamination, Air contamination, Glasses, Ions, Inspection, Raman spectroscopy, Pellicles, Photomasks, Fluorine, Adhesives

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Thin films, Quartz, Air contamination, Metals, Ions, Nitrogen, Inspection, Photomasks, Chemical analysis, Scanning probe microscopy

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