Manoj M. Chacko
Director/Product Management at Cadence Design Systems Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Data processing, Design for manufacturing, Photomasks, Computed tomography, Explosives, Optical proximity correction, Parallel computing, Electronic design automation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Image processing, Manufacturing, Field programmable gate arrays, Design for manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Halftones, Semiconducting wafers

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Metals, Silicon, Manufacturing, Data processing, Distributed computing, Photomasks, Optical proximity correction, Prototyping, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Databases, Metals, Silicon, Distributed computing, Photomasks, Optical proximity correction, Prototyping, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Phase shifting, Logic, Cadmium, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, SRAF, Binary data, Resolution enhancement technologies, Phase shifts

Showing 5 of 7 publications
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