Manoj M. Chacko
Director/Product Management at Cadence Design Systems Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical proximity correction, Photomasks, Computed tomography, Resolution enhancement technologies, Data processing, Design for manufacturing, Explosives, Parallel computing, Semiconductors, Electronic design automation

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Critical dimension metrology, Design for manufacturing, Halftones, Manufacturing, Semiconducting wafers, Image processing, Field programmable gate arrays

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Optical proximity correction, Silicon, Prototyping, Resolution enhancement technologies, Manufacturing, Metals, Distributed computing, Semiconductors, Data processing

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Photomasks, Optical proximity correction, Silicon, Prototyping, Resolution enhancement technologies, Metals, Distributed computing, Semiconductors, Databases

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Manufacturing, Logic, Semiconducting wafers, Phase shifts, Critical dimension metrology, Cadmium, Phase shifting

Showing 5 of 7 publications
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