Dr. Manouk Rijpstra
Physicist at ASML Netherlands BV
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Optical parametric oscillators, Optical lithography, Control systems, Data processing, Process control, High volume manufacturing, Feedback control, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Logic, Sensors, Scanners, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Lithographic process control

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Polarization, Sensors, Etching, Scanners, Monte Carlo methods, Optical alignment, Overlay metrology, Chemical mechanical planarization

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