Mans Bjuggren
Manager of Lithography at Mycronic AB
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Diffractive optical elements, Deep ultraviolet, Etching, Photomasks, Critical dimension metrology, Photoresist processing, Binary data, Standards development, Vestigial sideband modulation

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Deep ultraviolet, Image processing, Manufacturing, Laser applications, Printing, Spatial light modulators, Solids, Photomasks, Raster graphics

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Deep ultraviolet, Etching, Dry etching, Image processing, Laser applications, Chromium, Scanning electron microscopy, Photomasks, Photoresist processing, Chemically amplified resists

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Mirrors, Deep ultraviolet, Manufacturing, Spatial light modulators, Solids, Photomasks, Optical simulations, Image enhancement, Optical proximity correction, Raster graphics

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Diffractive optical elements, Etching, Manufacturing, Printing, Photomasks, Optical proximity correction, Photoresist processing, Laser systems engineering

Showing 5 of 11 publications
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