Manuel Jaramillo
Product Manager at Air Products and Chemicals Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Image processing, Line width roughness, Immersion lithography, Lutetium, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Standards development, 193nm lithography

Proceedings Article | 23 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Scanners, Electroluminescence, Scanning electron microscopy, Finite element methods, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Line width roughness, Plasma etching, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Plasma

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Manufacturing, Control systems, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Image processing, Scanners, Image resolution, Electroluminescence, Platinum, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Semiconducting wafers, Resist chemistry

Showing 5 of 11 publications
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