Manuela S. Gutsch
at Qoniac GmbH
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Oxides, Etching, Metals, Copper, Resistance, Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Chemical mechanical planarization

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Oxides, Etching, Metals, Copper, Resistance, Capacitance, Photomasks, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Double patterning technology, Critical dimension metrology, Molybdenum, Semiconducting wafers, Overlay metrology, Information operations

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Metals, Computer simulations, Feature extraction, Distance measurement, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Electrical breakdown

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Sensors, Metals, Image processing, Electrons, Inspection, Scanning electron microscopy, Wafer inspection, Semiconducting wafers, Tin, Defect inspection

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Electron beam lithography, Electron beams, Etching, Metals, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Back end of line

Showing 5 of 21 publications
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