Manvendra Chauhan
at Indian Institute of Technology Mandi
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Thin films, Electron beam lithography, Etching, Metals, Nickel, Silicon, Resistance, Line width roughness, Helium, Line edge roughness

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