Dr. Marc Bienert
at Carl Zeiss SMT AG
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Image processing, Solids, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Optics manufacturing, EUV optics, Fiber optic illuminators

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