Dr. Marc Corthout
General Manager at XTREME technologies GmbH
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Light sources, Scanners, Laser applications, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Electrodes, Scanners, Ultraviolet radiation, Reliability, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Curtains, Electrodes, Scanners, Reliability, Xenon, Extreme ultraviolet, Integrated optics, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Energy efficiency, Capacitors, Electrodes, Scanners, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

PROCEEDINGS ARTICLE | March 27, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Capacitors, Electrodes, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Astatine, Plasma, Tin

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Mirrors, Electrodes, Scanners, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 6 publications
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