Dr. Marc Fouchier
SPIE Involvement:
Publications (7)

Proceedings Article | 17 March 2015 Paper
Emmanuel Dupuy, E. Pargon, M. Fouchier, H. Grampeix, J. Pradelles, M. Darnon, P. Pimenta-Barros, S. Barnola, O. Joubert
Proceedings Volume 9428, 94280B (2015) https://doi.org/10.1117/12.2085812
KEYWORDS: Line edge roughness, Line width roughness, Plasma, Etching, Critical dimension metrology, Plasma etching, Silicon, Oxygen, Photoresist processing, Neodymium

SPIE Journal Paper | 28 October 2013
JM3, Vol. 12, Issue 04, 041308, (October 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041308
KEYWORDS: Line edge roughness, Atomic force microscopy, Etching, Plasma, Silicon, Critical dimension metrology, Photoresist materials, Plasma treatment, Plasma etching, Vacuum ultraviolet

SPIE Journal Paper | 25 September 2013
Laurent Azarnouche, Erwine Pargon, Kevin Menguelti, Marc Fouchier, Melisa Brihoum, Raphael Ramos, Olivier Joubert, Pascal Gouraud, Christophe Verove
JM3, Vol. 12, Issue 04, 041304, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041304
KEYWORDS: Line width roughness, Plasma, Vacuum ultraviolet, Plasma treatment, Optical lithography, Etching, Photoresist materials, Carbon, Plasma etching, Argon

Proceedings Article | 29 March 2013 Paper
Marc Fouchier, Erwine Pargon, Benjamin Bardet
Proceedings Volume 8685, 86850B (2013) https://doi.org/10.1117/12.2011554
KEYWORDS: Line edge roughness, Etching, Plasma, Atomic force microscopy, Plasma treatment, Silicon, Critical dimension metrology, Vacuum ultraviolet, System on a chip, Photoresist materials

Proceedings Article | 17 March 2012 Paper
L. Azarnouche, E. Pargon, K. Menguelti, M. Fouchier, M. Brihoum, R. Ramos, O. Joubert, P. Gouraud, C. Verove
Proceedings Volume 8328, 83280H (2012) https://doi.org/10.1117/12.920314
KEYWORDS: Line width roughness, Plasma, Vacuum ultraviolet, Plasma treatment, Etching, Photoresist materials, Carbon, Optical lithography, Plasma etching, Fractal analysis

Showing 5 of 7 publications
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