Dr. Marc Hauptmann
Team Lead EUV Defectivity at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Paper
Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee
Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028
KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

Proceedings Article | 24 March 2017 Paper
Honggoo Lee, Junghwan Moon, Jaesun Woo, Sangjun Han, Changrock Song, Marc Hauptmann, Weitian Kou, Alexander Ypma, Hyun-Woo Yu, Hank Han, Michiel Kupers, Paul Böcker, Daan Slotboom
Proceedings Volume 10147, 1014713 (2017) https://doi.org/10.1117/12.2259846
KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Optical lithography, Scanners, Optical alignment, Near infrared, Polishing

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