Dr. Marc D. Himel
Business Development Manager at
SPIE Involvement:
| Membership & Communities Committee | Strategic Planning Committee | Symposia Committee | Fellow status | Conference Program Committee | Author
Area of Expertise:
lithographic illumination , Leadership , applications of micro-optics , project management , management of technology
Profile Summary

Dr. Himel, an SPIE Fellow since 2010, received his BS degree in Physics from the California Polytechnic State University in 1984, his PhD in Optical Sciences from the University of Arizona in 1988, and an MBA from the University of Connecticut in 1998. Following his PhD, Dr. Himel worked as a Post Doctoral Research Associate at the Center for Research in Electro-Optics and Lasers at the University of Central Florida performing research on the characterization of thin film coatings. For 14 years, he worked in the design and development of advanced lithography systems starting with three years at AT&T Bell Laboratories working on the development of Extreme Ultraviolet Lithography, followed by five years at SVG Lithography Systems working on excimer laser based illumination systems, and twelve years at DigitalOptics Corporation) where he concentrated his efforts on the application of diffractive micro-optics for advanced lithography, inspection, and consumer applications. Dr. Himel is currently a Business Development Manager at Jenoptik Gmbh. His research and development activity has resulted in over 46 published papers and one patent.
Visiting Lecture Topics

• Micro-Optics: From Theory to Real World Application
• Values at Work
• Harnessing Light for a Better World
Publications (17)

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Lithographic illumination, Diffractive optical elements, Speckle, Scanners, Ions, Manufacturing, Source mask optimization, Stray light, Performance modeling

PROCEEDINGS ARTICLE | February 16, 2010
Proc. SPIE. 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
KEYWORDS: Optical components, Gaussian beams, Diffractive optical elements, Wavefronts, Collimation, Optical simulations, Beam shaping, Optical alignment, Stray light, Tolerancing

PROCEEDINGS ARTICLE | August 22, 2009
Proc. SPIE. 7430, Laser Beam Shaping X
KEYWORDS: Optical lithography, Lithographic illumination, Diffractive optical elements, Imaging systems, Cameras, Sensors, Optical testing, Excimers, Stray light, Tolerancing

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithium, Lithographic illumination, Diffractive optical elements, Image processing, Manufacturing, Photomasks, Source mask optimization, SRAF, Nanoimprint lithography, Model-based design

SPIE Journal Paper | April 1, 2008
MGSP Vol. 3 Issue 02

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconductors, Lithography, Lithographic illumination, Custom fabrication, Diffractive optical elements, Etching, Diffusers, Photomasks, Critical dimension metrology, Optics manufacturing

Showing 5 of 17 publications
Conference Committee Involvement (4)
Digital Optics for Immersive Displays (DOID18)
24 April 2018 | Strasbourg, France
Laser Beam Shaping XVII
29 August 2016 | San Diego, California, United States
Laser Beam Shaping XVI
10 August 2015 | San Diego, California, United States
Laser Beam Shaping XV
17 August 2014 | San Diego, California, United States
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