SP-100 from Satisloh is the perfect coating machine for application in precision optics. Thanks to its innovative concept SP-100 can coat materials in a range of refraction indexes from 1.47 up to 2.05 in the visible (with all the intermediate indexes in between) and up to n=3.5 in the infrared by using only one target material. SP-100 is well suitable for application in the field of microscopy, laser optics, watches, optical filters, endoscopy, semiconductors and more. By replacing the target material the application range of the machine can be further extended. SP-100 is based on the reliable reactive bipolar Direct Current (DC) pulsed magnetron sputtering technology which guarantees high density of the deposited species, low stress of the deposited multilayer film, high reproducibility, very high hardness (up to 1200 Vickers hardness) with unbeatable high rates ideal for industrial applications. DC-pulsed sputtering assure less arc events and a lower heat load than Radio Frequency (RF) sputtering making SP-100 suitable for different substrates material and for cemented lenses. The small chamber of the SP-100 ensures very fast processes and a broadband AR can be coated in less than 15 minutes process time door to door. Thanks to its flexible substrate holder SP-100 can hold lenses of different sizes and shapes: from small size optics up to 100 mm diameter lenses, rod lenses up to 50 mm length or even glass fibers.
Silicon targets as a single source for reactive magnetron sputtering provide a variety of advantages. The single-target
approach offers, for example, the possibility to build very compact sputtering systems. The implementation of pulsed
power results not only in non-arcing sputtering conditions but also in deposition of dense dielectric layers with smooth
surfaces. Various film materials can be deposited simply by using different gases such as argon, as well as the reactive
gases nitrogen and oxygen. In the visible range (380nm-780nm) silicon-oxides, silicon-nitrides and all kinds of siliconoxy-
nitrides with a refractive index range of 1.44-2.05 can be used for many different optical thin film coatings. Pure
silicon and silicon-sub-oxides with refractive indices up to 3.5 can be applied for coatings in the near infrared (NIR)/
infrared (IR)-region. High deposition rates of up to 2 nanometers per second, in combination with short pumping times
of about 3-5 minutes, lead to extremely fast coating cycles. The machine concept and several possible applications, as for
example Bragg mirrors and narrow band-pass filters in the NIR, will be presented. Anti-reflective coatings fabricated by
this method have Vickers hardness values higher than 1000 HV and show superior scratch-resistance. Furthermore it is
possible to produce Nd:YAG laser mirrors with high laser damage thresholds.