Mr. Marco Guévremont
Sr Product Manager at
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 12, 2012
Proc. SPIE. 8473, Laser Material Processing for Solar Energy
KEYWORDS: Optical lithography, Solar cells, Silicon, Laser processing, Laser drilling, Laser ablation, Beam shaping, Transparent conductors, Semiconducting wafers, Pulsed laser operation

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Metrology, Electron microscopes, Scanning electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Scanning electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Finite element methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Metrology, Dielectrics, Silicon, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | August 22, 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Metrology, Spectroscopy, Control systems, Scanning electron microscopy, Precision measurement, Process control, Critical dimension metrology, Semiconducting wafers, Spectroscopes, Single crystal X-ray diffraction

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